Separation of an imprint lithography template and a patterned layer in an imprint lithography process may result in stress to features of the template and/or features of the patterned layer. Such stress may be reduced by minimizing open areas on the template, including dummy features within the open...http://www.google.com/patents/US8075299?utm_source=gb-gplus-sharePatent US8075299 - Reduction of stress during template separation
