One aspect of the invention relates to a method of manufacturing a semiconductor device in which an alignment mark is formed by a plurality of adjacent filled trenches. A processing tool detects the trenches as though they were a single filled trench of larger dimension. When the trenches are metal filled,...http://www.google.com/patents/US6660612?utm_source=gb-gplus-sharePatent US6660612 - Design to prevent tungsten oxidation at contact alignment in FeRAM
