A probe for measuring plasma properties in a processing chamber, comprises a conductive rod having a front portion and a rear portion. The front portion of the conductive rod comprises a probe surface adapted to be coplanar with an interior wall of the chamber. The probe also includes an insulating sheath...http://www.google.com/patents/US20030227283?utm_source=gb-gplus-sharePatent US20030227283 - Non-intrusive plasma probe
