Cyclical methods of depositing a ruthenium film on a substrate are provided. In one process, each cycle includes supplying a ruthenium organometallic compound gas to the reactor; purging the reactor; supplying a ruthenium tetroxide (RuO4) gas to the reactor; and purging the reactor. In another process,...http://www.google.com/patents/US20080171436?utm_source=gb-gplus-sharePatent US20080171436 - METHODS OF DEPOSITING A RUTHENIUM FILM
