Exposure masks and inspection masks for use in the electronics field may be made using laser beams wherein the mask comprises a substrate which is substantially unaffected by exposure to the laser beam and an opaque pattern forming layer on the substrate, which pattern forming layer absorbs the laser...http://www.google.com/patents/US5958628?utm_source=gb-gplus-sharePatent US5958628 - Formation of punch inspection masks and other devices using a laser
