A method and apparatus for conditioning a polishing pad is described. The method includes steps of moving a cylindrical roller having an abrasive substance affixed to it against a moving polishing pad. The roller may be passively rotated by contact with the polishing pad, or actively reciprocated, while...http://www.google.com/patents/US6328637?utm_source=gb-gplus-sharePatent US6328637 - Method and apparatus for conditioning a polishing pad used in chemical mechanical planarization
