(12) United States Patent ao) Patent No.: us 6,395,128 B2
Sharan et al. (45) Date of Patent: *May 28,2002
(54) RF POWERED PLASMA ENHANCED
CHEMICAL VAPOR DEPOSITION REACTOR
AND METHODS OF EFFECTING PLASMA
ENHANCED CHEMICAL VAPOR
(75) Inventors: Sujit Sharan; Gurtej S. Sandhu, both of Boise, ID (US); Paul Smith, San Jose; Mei Chang, Saratoga, both of CA (US)
(73) Assignees: Micron Technology, Inc., Boise, ID (US); Applied Materials, Inc., Santa Clara, CA (US)
( * ) Notice: This patent issued on a continued prosecution application filed under 37 CFR 1.53(d), and is subject to the twenty year patent term provisions of 35 U.S.C. 154(a)(2).
Subject to any disclaimer, the term of this patent is extended or adjusted under 35 U.S.C. 154(b) by 0 days.
(21) Appl. No.: 09/026,042
(22) Filed: Feb. 19, 1998
(51) Int. CI.7 H05H 1/00; C23C 16/00
(52) U.S. CI 156/345; 118/723 E; 118/723 I
(58) Field of Search 204/298.33; 118/728,
118/723 E, 723 I; 216/71; 156/345
(56) References Cited
U.S. PATENT DOCUMENTS
4,585,516 A 4/1986 Corn et al 156/643
5,039,388 A 8/1991 Miyashita 204/192.32
5,052,339 A 10/1991 Vakerlis 118/723
5,102,523 A * 4/1992 Beisswenger et al. . 204/298.33
5,147,493 A 9/1992 Nishimura et al.
5,230,931 A 7/1993 Yamasaki 427/569
5,260,236 A 11/1993 Petro 437/241
(List continued on next page.)
Rayner, J.P, Radio frequency matching for helicon plasma sources, J.Vac.Sci.Technol.A14(4),Jul./Aug. 1996, Jul. 1, 1996.*
Merriam Webster's Collegiate Dictionary—Tenth Edition, ©1996. p. 818 only.
Primary Examiner—Gregory Mills
Assistant Examiner—P. Hassanzadeh
(74) Attorney, Agent, or Firm—Wells, St. John, Roberts,
Gregory & Matkin PS.
Plasma enhanced chemical vapor deposition (PECVD) reactors and methods of effecting the same are described. In accordance with a preferred implementation, a reaction chamber includes first and second electrodes operably associated therewith. A single RF power generator is connected to an RF power splitter which splits the RF power and applies the split power to both the first and second electrodes. Preferably, power which is applied to both electrodes is in accordance with a power ratio as between electrodes which is other than a 1:1 ratio. In accordance with one preferred aspect, the reaction chamber comprises part of a parallel plate PECVD system. In accordance with another preferred aspect, the reaction chamber comprises part of an inductive coil PECVD system. The power ratio is preferably adjustable and can be varied. One manner of effecting a power ratio adjustment is to vary respective electrode surface areas. Another manner of effecting the adjustment is to provide a power splitter which enables the output power thereof to be varied. PECVD processing methods are described as well.
17 Claims, 4 Drawing Sheets