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US 20060015206A1

(19) United States

(12) Patent Application Publication (io) Pub. No.: US 2006/0015206 Al

Funk et al. (43) Pub. Date: Jan. 19,2006

(54) FORMULA-BASED RUN-TO-RUN CONTROL

(75) Inventors: Merritt Funk, Austin, TX (US); Kevin Augustine Pinto, Austin, TX (US); Asao Yamashita, Wappingers Falls, NY (US); Wesley Natzle, New Paltz, NY (US)

Correspondence Address:

PILLSBURY WINTHROP SHAW PITTMAN,
LLP

P.O. BOX 10500
MCLEAN, VA 22102 (US)

(73) Assignees: Tokyo Electron Limited, Tokyo (JP);

International Business Machines Corporation, Armonk, NY

(21) Appl. No.: 10/890,410

(22) Filed: Jul. 14, 2004

Publication Classification

(52) U.S. CI 700 121

(51) Int. CI.

G06F 19/00

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(2006.01)

A dual chamber apparatus including a first chamber and a second chamber which is configured to be coupled to the first chamber at an interlace. Each ol the first chamber and the second chamber has a transler opening located at the interlace. An insulating plate is located on one ol the first chamber and the second chamber at the interlace and is configured to have a low thermal conductivity such that the first chamber and the second chamber can be independently controlled at different temperatures when the first chamber and the second chamber are coupled together. Additionally, the apparatus may include an alignment device and/or a lastening device for lastening the first chamber to the second chamber. In embodiments, the insulating plate may be constructed ol Teflon. Further, the first chamber may be a chemical oxide removal treatment chamber and the second chamber may be a heat treatment chamber.

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