A process for fabricating a semiconductor device comprising the step of, after patterning the silicon film crystallized to a low degree by thermally annealing an amorphous silicon film into an island by etching, irradiating an intense light of a visible light or a near infrared radiation to effect a...http://www.google.com/patents/US20060113541?utm_source=gb-gplus-sharePatent US20060113541 - Process for fabricating semiconductor device