A method and apparatus for depositing a film on a substrate by plasma-enhanced chemical vapor deposition at temperatures substantially lower than conventional thermal CVD temperatures comprises placing a substrate within a reaction chamber and exciting a first gas upstream of the substrate to generate...http://www.google.com/patents/US6220202?utm_source=gb-gplus-sharePatent US6220202 - Apparatus for producing thin films by low temperature plasma-enhanced chemical vapor deposition
Apparatus for producing thin films by low temperature plasma-enhanced ...
