Differently-sized features of an integrated circuit are formed by etching a substrate using a mask which is formed by combining two separately formed patterns. Pitch multiplication is used to form the relatively small features of the first pattern and conventional photolithography used to form the relatively...http://www.google.com/patents/US7253118?utm_source=gb-gplus-sharePatent US7253118 - Pitch reduced patterns relative to photolithography features
Pitch reduced patterns relative to photolithography features
