A method of forming a semiconductor structure, and the semiconductor structure so formed, wherein a transmission line, such as an inductor, is formed on a planar level above the surface of a last metal wiring level....http://www.google.com/patents/US7410894?utm_source=gb-gplus-sharePatent US7410894 - Post last wiring level inductor using patterned plate process
Post last wiring level inductor using patterned plate process
