In a first aspect, a module is provided that is adapted to process a wafer. The module includes a processing portion having one or more features such as (1) a rotatable wafer support for rotating an input wafer from a first orientation wherein the wafer is in line with a load port to a second orientation...http://www.google.com/patents/US7980255?utm_source=gb-gplus-sharePatent US7980255 - Single wafer dryer and drying methods
