Certain MEMS devices include layers patterned to have tapered edges. One method for forming layers having tapered edges includes the use of an etch leading layer. Another method for forming layers having tapered edges includes the deposition of a layer in which the upper portion is etchable at a faster...http://www.google.com/patents/US7486867?utm_source=gb-gplus-sharePatent US7486867 - Methods for forming layers within a MEMS device using liftoff processes to achieve a tapered edge
Methods for forming layers within a MEMS device using liftoff processes to ...