Methods and systems selectively irradiate structures on or within a semiconductor substrate using a plurality of pulsed laser beams. The structures are arranged in a row extending in a generally lengthwise direction. The method generates a first pulsed laser beam that propagates along a first laser beam...http://www.google.com/patents/US7923306?utm_source=gb-gplus-sharePatent US7923306 - Semiconductor structure processing using multiple laser beam spots
Semiconductor structure processing using multiple laser beam spots