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    Publication numberDE2308830 B2
    Publication typeApplication
    Application numberDE19732308830
    Publication dateJun 26, 1975
    Filing dateFeb 22, 1973
    Priority dateFeb 22, 1973
    Also published asDE2308830A1, US3957512
    Publication number19732308830, 732308830, DE 2308830 B2, DE 2308830B2, DE-B2-2308830, DE19732308830, DE2308830 B2, DE2308830B2, DE732308830
    InventorsWolfgang Dr. 8520 Erlangen Kleeberg, Roland Dr. 8551 Roettenbach Rubner, Wieland 8510 Fuerth Bartel
    ApplicantSiemens Ag, 1000 Berlin Und 8000 Muenchen
    Export CitationBiBTeX, EndNote, RefMan
    Referenced by (5), Classifications (12), Legal Events (3)
    External Links: DPMA, Espacenet

    DE 2308830 B2
    Abstract  available in
    Description  available in
    Claims  available in
    Referenced by
    Citing PatentFiling datePublication dateApplicantTitle
    DE2849981A1 *Nov 17, 1978May 23, 1979Asahi Chemical IndWaermebestaendiges photoresistmaterial und verfahren zu seiner herstellung
    DE2950212A1 *Dec 13, 1979Jun 19, 1980Fujitsu LtdNegative tiefultraviolette abdeckung und verfahren zum herstellen eines abdeckungsmusters
    EP0025506A1 *Aug 6, 1980Mar 25, 1981Siemens AktiengesellschaftPolyoxazole precursors, their preparation and their use
    EP0041677A2 *Jun 1, 1981Dec 16, 1981Siemens AktiengesellschaftRadiation reactive precursors of highly heat-resistant polymers, and their use
    EP0041677A3 *Jun 1, 1981Dec 29, 1982Siemens AktiengesellschaftRadiation reactive precursors of highly heat-resistant polymers, and their use
    * Cited by examiner
    Classifications
    International ClassificationC08G18/67, G03F7/038, C08G73/00, C08G73/10, G03F7/004, C07C255/34, C08F299/00, C08F290/00
    Cooperative ClassificationG03F7/0387, C07C255/00
    European ClassificationC07C255/00, G03F7/038P
    Legal Events
    DateCodeEventDescription
    Feb 12, 1976C3Grant after two publication steps (3rd publication)
    Dec 31, 1977E77Valid patent as to the heymanns-index 1977
    Oct 27, 1983AGHas addition no.
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