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    Publication numberWO2003085457 A1
    Publication typeApplication
    Application numberPCT/JP2003/004500
    Publication dateOct 16, 2003
    Filing dateApr 9, 2003
    Priority dateApr 10, 2002
    Also published asCN1659479A, US6894712, US7015488, US7048528, US7077972, US7079169, US20030214571, US20050175302, US20050179772, US20050180692, US20050191016
    Publication numberPCT/2003/4500, PCT/JP/2003/004500, PCT/JP/2003/04500, PCT/JP/3/004500, PCT/JP/3/04500, PCT/JP2003/004500, PCT/JP2003/04500, PCT/JP2003004500, PCT/JP200304500, PCT/JP3/004500, PCT/JP3/04500, PCT/JP3004500, PCT/JP304500, WO 03085457 A1, WO 03085457A1, WO 2003/085457 A1, WO 2003085457 A1, WO 2003085457A1, WO-A1-03085457, WO-A1-2003085457, WO03085457 A1, WO03085457A1, WO2003/085457A1, WO2003085457 A1, WO2003085457A1
    InventorsHiromi Ishikawa, Kazuhiko Nagano, Yoji Okazaki, Takeshi Fujii, Hiromitsu Yamakawa
    ApplicantFuji Photo Film Co., Ltd., Fuji Photo Optical Co., Ltd.
    Export CitationBiBTeX, EndNote, RefMan
    External Links: Patentscope, Espacenet
    Exposure head, exposure apparatus, and its application
    WO 2003085457 A1
    Abstract
    An exposure head and exposure apparatus for controlling pixel portions fewer than all the pixel portions arrayed on a substrate by a control signal generated according to exposure information with respect to a spatial modulating device. The controlled pixel portions become less because all the pixel portions arrayed on the substrate are not controlled, and therefore the transfer rate of the control signal is short. Thus, the modulation speed of a laser beam can be increased thereby to achieve high-speed exposure. As the laser device, a fiber-array light source including multiplexed laser light source where laser beams are multiplexed and inputted into optical fibers is used. As a result high luminance and high output are achieved. Especially it is effective in a semiconductor laser. The number of optical fibers arrayed can be small, resulting in low cost and small emission area when arrayed. The exposure apparatus can be variously applied to, for example, a laser lithograph a laser lithograph.
    Patent Citations
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    JPS59214734A * Title not available
    JPS61117552A * Title not available
    US4575330 *Aug 8, 1984Mar 11, 1986Uvp, Inc.Apparatus for production of three-dimensional objects by stereolithography
    Classifications
    International ClassificationB41J2/447, B23K26/06, D06L3/04, B41J2/47, D06M10/00, G02B26/08, H04N1/12, H04N1/191, G03F7/20, B41J2/465, B29C67/00
    Cooperative ClassificationB33Y30/00, D06L4/50, B41J2/451, B23K26/066, B29C67/0077, B41J2/45, B29C67/0066, G03F7/7005, D06M10/005, B23K26/0604, B41J2/47, H04N1/12, G03F7/70291, H04N1/1916, H04N1/191, B41J2/465, G02B26/0841
    European ClassificationB23K26/06C7, G03F7/70B10, B41J2/45, G03F7/70F14B, H04N1/191B8, B29C67/00R4B, G03F7/20S3, D06M10/00D, B23K26/06A, D06L3/04, H04N1/191, G02B26/08M4E, B41J2/465, B41J2/47, B29C67/00R2D2
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