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    Publication numberWO2004029037 A1
    Publication typeApplication
    Application numberPCT/JP2003/012226
    Publication dateApr 8, 2004
    Filing dateSep 25, 2003
    Priority dateSep 25, 2002
    Also published asEP1557413A1, EP1557413A4, EP1557413B1, EP2308865A1, EP2308865B1, US7611817, US20060055088
    Publication numberPCT/2003/12226, PCT/JP/2003/012226, PCT/JP/2003/12226, PCT/JP/3/012226, PCT/JP/3/12226, PCT/JP2003/012226, PCT/JP2003/12226, PCT/JP2003012226, PCT/JP200312226, PCT/JP3/012226, PCT/JP3/12226, PCT/JP3012226, PCT/JP312226, WO 2004/029037 A1, WO 2004029037 A1, WO 2004029037A1, WO-A1-2004029037, WO2004/029037A1, WO2004029037 A1, WO2004029037A1
    InventorsTetsuyuki Nakayashiki, Hiroyuki Tachikawa
    ApplicantAsahi Denka Co.Ltd.
    Export CitationBiBTeX, EndNote, RefMan
    Patent Citations (7), Non-Patent Citations (4), Referenced by (11), Classifications (31), Legal Events (9)
    External Links: Patentscope, Espacenet
    Novel aromatic sulfonium salt compound, photo-acid generator comprising the same and photopolymerizable composition containing the same, resin composition for optical three-dimensional shaping, and method of optically forming three-dimensional shape
    WO 2004029037 A1
    Abstract
    A novel aromatic sulfonium salt compound represented by the following general formula (I); (I) a photo-acid generator comprising the compound; and a photopolymerizable composition containing the compound. The photopolymerizable composition gives a resin composition for optical three-dimensional shaping. The resin composition suffers no curing inhibition caused by oxygen, has satisfactory precision of curing, is highly sensitive to irradiation energy, and cures sufficiently deep. The resin composition can be inhibited from generating benzene and is hence usable in a wide range of applications such as photoresists, inks for food-packaging materials, etc.
    Patent Citations
    Cited PatentFiling datePublication dateApplicantTitle
    WO1999028295A1 *Dec 4, 1998Jun 10, 1999Asahi Denka Kogyo Kabushiki KaishaNovel aromatic sulfonium compounds, photoacid generators comprising the same, photopolymerizable compositions containing the same, stereolithographic resin compositions, and stereolithographic process
    JP2000186071A Title not available
    JP2001288205A Title not available
    JPH10204083A * Title not available
    JPH11269212A * Title not available
    JPS5749613A Title not available
    JPS5837004A Title not available
    * Cited by examiner
    Non-Patent Citations
    Reference
    1"Kohsoku sanjigen seikei no kiso", 1993, NIKKEI PUBLISHING CENTER., pages: 258
    2 *J. ORG. CHEM., vol. 55, no. 13, 1990, pages 4222 - 4225, XP002974698
    3MATERIAL STAGE, vol. 2, no. 2, 2002
    4 *See also references of EP1557413A4
    * Cited by examiner
    Referenced by
    Citing PatentFiling datePublication dateApplicantTitle
    WO2007046442A1 *Oct 18, 2006Apr 26, 2007Tokyo Ohka Kogyo Co., Ltd.Novel compound, acid generator, chemical amplification type photoresist composition, resist layer laminate and method of forming resist pattern
    WO2007063652A1 *Oct 20, 2006Jun 7, 2007Konica Minolta Medical & Graphic, Inc.Photoacid generator composition, cationically photopolymerizable composition, inkjet ink and inkjet recording method using same
    WO2009001420A1 *Jun 25, 2007Dec 31, 2008Cmet Inc.Optical three-dimensional molding polymerizable resin composition
    WO2009020089A1 *Aug 4, 2008Feb 12, 2009Adeka CorporationAromatic sulfonium salt compound
    WO2011052327A1 *Sep 28, 2010May 5, 2011Adeka CorporationAromatic sulfonium salt compound
    WO2011075555A1Dec 16, 2010Jun 23, 2011Dsm Ip Assets, B.V.Led curable liquid resin compositions for additive fabrication
    WO2011084578A1Dec 16, 2010Jul 14, 2011Dsm Ip Assets, B.V.Substrate-based additive fabrication process
    WO2011091228A1Jan 21, 2011Jul 28, 2011Dsm Ip Assets B.V.Liquid radiation curable resins capable of curing into layers with selective visual effects and methods for the use thereof
    WO2017018472A1 *Jul 28, 2016Feb 2, 2017東亞合成株式会社Active-energy-ray curing adhesive composition for plastic film or plastic sheet
    EP2502728A1Apr 1, 2011Sep 26, 2012DSM IP Assets B.V.Lightweight and High Strength Three-Dimensional Articles Producible by Additive Fabrication Processes
    US8227624Aug 4, 2008Jul 24, 2012Adeka CorporationAromatic sulfonium salt compound
    * Cited by examiner
    Classifications
    International ClassificationG03F7/004, C07D333/76, C09D11/10, G03F7/038, G03F7/029, C08K5/378, G03F7/00, C08G59/68
    Cooperative ClassificationB33Y70/00, C07D333/76, Y10S430/106, Y10S430/115, C08G59/687, B41C1/003, C08K5/378, G03F7/029, G03F7/0045, G03F7/0037, Y10S430/114, G03F7/038, B41M5/0023, B41M3/16, C09D11/101
    European ClassificationC09D11/101, G03F7/029, C08G59/68F, G03F7/038, G03F7/004D, C07D333/76, G03F7/00S, B41C1/00N
    Legal Events
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