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    Publication numberWO2006059458 A1
    Publication typeApplication
    Application numberPCT/JP2005/020416
    Publication dateJun 8, 2006
    Filing dateNov 8, 2005
    Priority dateDec 3, 2004
    Also published asCN101048377A, CN101048377B
    Publication numberPCT/2005/20416, PCT/JP/2005/020416, PCT/JP/2005/20416, PCT/JP/5/020416, PCT/JP/5/20416, PCT/JP2005/020416, PCT/JP2005/20416, PCT/JP2005020416, PCT/JP200520416, PCT/JP5/020416, PCT/JP5/20416, PCT/JP5020416, PCT/JP520416, WO 2006/059458 A1, WO 2006059458 A1, WO 2006059458A1, WO-A1-2006059458, WO2006/059458A1, WO2006059458 A1, WO2006059458A1
    InventorsMitsuo Akutsu, Daisuke Sawamoto
    ApplicantAdeka Corporation
    Export CitationBiBTeX, EndNote, RefMan
    Patent Citations (2), Referenced by (12), Classifications (10), Legal Events (6)
    External Links: Patentscope, Espacenet
    Oxime ester compound and photopolymerization initiator comprising the compound
    WO 2006059458 A1
    Abstract
    An oxime ester compound characterized by being represented by the following general formula (I). It is useful as a photopolymerization initiator. The oxime ester compound has high sensitivity and a high heat decomposition temperature. It does not impair the adhesion and alkali resistance of a photosensitive composition. The decomposition products generated from the compound by light irradiation do not adhere to a mask. (I) (In the formula, X represents alkyl, etc., provided that when m is 2 or larger, then the X's may be different; R1, R2, and R3 each represents, e.g., an alkyl or another group, which may be substituted by a halogen atom, etc. and in which the alkylene moiety may be separated by an unsaturated bond, ether bond, etc.; A represents cycloalkylalkyl; and m is 1-4.)
    Patent Citations
    Cited PatentFiling datePublication dateApplicantTitle
    JP2004534797A * Title not available
    JP2005054012A * Title not available
    * Cited by examiner
    Referenced by
    Citing PatentFiling datePublication dateApplicantTitle
    WO2008138724A1 *Apr 24, 2008Nov 20, 2008Basf SeOxime ester photoinitiators
    WO2011069943A1Dec 6, 2010Jun 16, 2011Agfa-GevaertUv-led curable compositions and inks
    WO2011069947A1Dec 6, 2010Jun 16, 2011Agfa-GevaertPhotoinitiators for uv-led curable compositions and inks
    CN101687794BApr 24, 2008Sep 11, 2013巴斯夫欧洲公司Oxime ester photoinitiators
    EP2037323A3 *Jul 17, 2008Dec 2, 2009FUJIFILM CorporationPhotosensitive compositions, curable compositions, novel compounds, photopolymerizable compositions, color filters, and planographic printing plate precursors
    EP2207062A3 *Jul 17, 2008Apr 6, 2011FUJIFILM CorporationPhotosensitive compositions, curable compositions, novel compounds, photopolymerizable compositions, color filters, and planographic printing plate precursors
    EP2402315A1 *Apr 24, 2008Jan 4, 2012Basf SeOxime ester photoinitiators
    US8361681Feb 23, 2009Jan 29, 2013Fujifilm CorporationPolymerizable compositions, color filters, production methods thereof, and solid-state imaging devices
    US8569393Dec 6, 2010Oct 29, 2013Agfa-Gevaert N.V.UV-LED curable compositions and inks
    US8728686Jul 17, 2008May 20, 2014Fujifilm CorporationPhotosensitive compositions, curable compositions, novel compounds, photopolymerizable compositions, color filters, and planographic printing plate precursors
    US8911921Apr 24, 2008Dec 16, 2014Ciba CorporationOxime ester photoinitiators
    US8957224Dec 6, 2010Feb 17, 2015Agfa Graphics NvPhotoinitiators for UV-LED curable compositions and inks
    * Cited by examiner
    Classifications
    International ClassificationC08F2/50, G03F7/031, C08F4/00, C07D209/86
    Cooperative ClassificationC07D209/86, C08F2/50, G03F7/031
    European ClassificationC07D209/86, G03F7/031, C08F2/50
    Legal Events
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